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US Patent Issued to FEI on July 21 for "System for sensor protection in electron imaging applications" (Dutch Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,996, issued on July 21, was assigned to FEI COMPANY (Hillsboro, Ore.). "System for sensor protection in electron imaging applications" was ... और पढ़ें


US Patent Issued to DOCTOR X WORKS BV (NL/NL) on July 21 for "Microwave synchronisation system" (Dutch Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,997, issued on July 21, was assigned to DOCTOR X WORKS BV (NL/NL) (Eindhoven, Netherlands). "Microwave synchronisation system" was invented... और पढ़ें


US Patent Issued to D2S on July 21 for "Method and system for determining a charged particle beam exposure for a local pattern density" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,998, issued on July 21, was assigned to D2S Inc. (San Jose, Calif.). "Method and system for determining a charged particle beam exposure fo... और पढ़ें


US Patent Issued to Applied Materials on July 21 for "Symmetric antenna arrays for high density plasma enhanced process chamber" (South Korean, American Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,999, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Symmetric antenna arrays for high density plasma enh... और पढ़ें


US Patent Issued to Semes on July 21 for "Substrate processing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,000, issued on July 21, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea). "Substrate processing apparatus" was invented by Sangjeon... और पढ़ें


US Patent Issued to Tokyo Electron on July 21 for "Plasma potential adjustment circuit" (American, Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,001, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma potential adjustment circuit" was invented by Qiang Wang (Aust... और पढ़ें


US Patent Issued to Tokyo Electron on July 21 for "Plasma processing apparatus, power source system, and plasma processing method" (Taiwanese Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,002, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Plasma processing apparatus, power source system, and plasma processi... और पढ़ें


US Patent Issued to Tokyo Electron on July 21 for "Film deposition apparatus" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,003, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Film deposition apparatus" was invented by Taehoon Park (Gyeonggi-do,... और पढ़ें


US Patent Issued to Tokyo Electron, The University of Shiga Prefecture on July 21 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,004, issued on July 21, was assigned to Tokyo Electron Ltd. (Tokyo) and The University of Shiga Prefecture (Shiga, Japan). "Plasma processi... और पढ़ें


US Patent Issued to WONIK IPS on July 21 for "Substrate processing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,005, issued on July 21, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea). "Substrate processing apparatus" was invented by Y... और पढ़ें